The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2016

Filed:

Nov. 02, 2015
Applicant:

Mitsubishi Materials Corporation, Tokyo, JP;

Inventors:

Toshiyuki Ishii, Yokkaichi, JP;

Hideo Ito, Kuwana, JP;

Yuji Shimizu, Naka-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/107 (2006.01); B01J 12/00 (2006.01); B01J 19/02 (2006.01); B01J 19/24 (2006.01);
U.S. Cl.
CPC ...
C01B 33/1071 (2013.01); B01J 12/007 (2013.01); B01J 19/02 (2013.01); B01J 19/243 (2013.01); B01J 2219/00135 (2013.01); B01J 2219/00155 (2013.01); B01J 2219/0272 (2013.01);
Abstract

An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and the gas supply section and the gas discharge section are connected to the reaction passageway.


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