The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
Mar. 19, 2015
Applicant:
Jsr Corporation, Tokyo, JP;
Inventors:
Hayato Namai, Tokyo, JP;
Goji Wakamatsu, Tokyo, JP;
Assignee:
JSR CORPORATION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/033 (2006.01); C08L 47/00 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); B05D 3/02 (2006.01); C08F 12/32 (2006.01); C08F 12/34 (2006.01); C09D 125/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0332 (2013.01); B05D 3/0254 (2013.01); C08F 12/32 (2013.01); C08F 12/34 (2013.01); C08L 47/00 (2013.01); C09D 125/16 (2013.01); G03F 7/09 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/20 (2013.01); H01L 21/0271 (2013.01); H01L 21/0276 (2013.01); H01L 21/02118 (2013.01); H01L 21/31144 (2013.01);
Abstract
A composition for film formation includes a compound represented by formula (1), and a solvent. Rrepresents a monovalent group including an aromatic ring. n is an integer of 3 to 6. At least one monovalent group represented by Rfurther includes a group including an ethylenic double bond. a plurality of Rs are identical or different. A part or all of hydrogen atoms on the benzene ring in the formula (1) and on the aromatic ring are unsubstituted or substituted with a halogen atom or an alkyl group having 1 to 10 carbon atoms.