The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
Feb. 21, 2012
Sang-yeol Kang, Seoul, KR;
Suk-jin Chung, Hwaseong-si, KR;
Youn-soo Kim, Yongin-si, KR;
Jae-hyoung Choi, Hwaseong-si, KR;
Jae-soon Lim, Seoul, KR;
Min-young Park, Seoul, KR;
Sang-Yeol Kang, Seoul, KR;
Suk-Jin Chung, Hwaseong-si, KR;
Youn-Soo Kim, Yongin-si, KR;
Jae-Hyoung Choi, Hwaseong-si, KR;
Jae-Soon Lim, Seoul, KR;
Min-Young Park, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
To form a dielectric layer, an organometallic precursor is adsorbed on a substrate loaded into a process chamber. The organometallic precursor includes a central metal and ligands bound to the central metal. An inactive oxidant is provided onto the substrate. The inactive oxidant is reactive with the organometallic precursor. An active oxidant is also provided onto the substrate. The active oxidant has a higher reactivity than that of the inactive oxidant.