The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Jul. 22, 2015
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Abraham Ravid, San Jose, CA (US);
Todd J. Egan, Fremont, CA (US);
Eran Weiss, Sunnyvale, CA (US);
Michael R. Rice, Pleasanton, CA (US);
Izya Kremerman, Los Gatos, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01); G06F 19/00 (2011.01); G05B 19/19 (2006.01);
U.S. Cl.
CPC ...
G05B 19/19 (2013.01); G05B 2219/39157 (2013.01); G05B 2219/40572 (2013.01);
Abstract
An optical calibration method and apparatus for calibration of wafer positioning within a reactor chamber under process conditions employs an array of cameras in a lid of the chamber using images of the wafer edge to locate the wafer relative to the reference feature.