The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Jun. 12, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Ingo Saenger, Heidenheim, DE;
Christoph Hennerkes, Huettlingen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The invention relates to an optical system of a microlithographic projection exposure apparatus, comprising at least one mirror arrangement having a plurality of mirror elements which are adjustable independently of one another for the purpose of changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical element, which generates, for impinging light having a constantly linear or a circular input polarization distribution, an output polarization distribution having a direction of polarization that varies continuously over the light beam cross section.