The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2016
Filed:
Sep. 06, 2013
The Texas A&m University System, College Station, TX (US);
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Sangho Cho, Bryan, TX (US);
Guorong Sun, Bryan, TX (US);
Karen L. Wooley, College Station, TX (US);
James W. Thackeray, Braintree, MA (US);
Peter Trefonas, III, Medway, MA (US);
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
THE TEXAS A&M UNIVERSITY SYSTEM, College Station, TX (US);
Abstract
Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.