The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2016
Filed:
May. 05, 2014
Applicant:
Cabot Microelectronics Corporation, Aurora, IL (US);
Inventors:
Hon Wu Lau, Aurora, IL (US);
Michael White, Ridgefield, CT (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
G09G 1/02 (2006.01); B24B 37/04 (2012.01); H01L 21/321 (2006.01); C09G 1/04 (2006.01);
U.S. Cl.
CPC ...
G09G 1/02 (2013.01); B24B 37/044 (2013.01); C09G 1/04 (2013.01); H01L 21/3212 (2013.01);
Abstract
The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising wet-process silica particles, (b) a water-soluble polymer, (c) an oxidizing agent, (d) a chelating agent, (e) a pH-adjusting agent, and (f) an aqueous carrier, wherein the pH of the polishing composition is about 1 to about 7. The invention also provides a method of polishing a substrate, especially a nickel-phosphorus substrate, with the polishing composition.