The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2016

Filed:

Jun. 27, 2013
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Xue Yang, Arcadia, CA (US);

Yang Lei, Hillsboro, OR (US);

Aveek Purohit, San Jose, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V 3/38 (2006.01); G01C 21/04 (2006.01); G01S 5/02 (2010.01); G01C 21/20 (2006.01); G06F 11/30 (2006.01);
U.S. Cl.
CPC ...
G01C 21/04 (2013.01); G01C 21/20 (2013.01); G01S 5/0252 (2013.01);
Abstract

A method of determining landmarks includes receiving, at a computing system, a plurality of potential landmark measurements and corresponding signal measurements. The method further includes determining, at the computing system, a plurality of landmark candidates from the plurality of potential landmark candidates and corresponding signal measurements. The method further includes determining a normalized signal distance between a first signal measurement corresponding to a first landmark candidate of the plurality of landmark candidates and a second signal measurement corresponding to a second landmark candidate of the plurality of landmark candidates. The method further includes determining, at the computing system, that the first landmark corresponds to the second landmark based on the normalized signal distance.


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