The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Mar. 27, 2014
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Ruihua Ding, San Jose, CA (US);

Min Wang, Santa Clara, CA (US);

Mo Liu, Santa Clara, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/02 (2006.01); H01P 3/04 (2006.01); H04B 3/32 (2006.01); H05K 3/10 (2006.01); H01P 3/02 (2006.01); H01P 1/203 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0245 (2013.01); H01P 3/026 (2013.01); H01P 3/04 (2013.01); H04B 3/32 (2013.01); H05K 3/10 (2013.01); H01P 1/203 (2013.01); Y10T 29/49155 (2015.01);
Abstract

This disclosure relates generally to an electronic assembly and method having a first electrical connection point and a second electrical connection point and a differential interconnect coupling the first electrical connection point to the second electrical connection point, the differential interconnect including first and second transmission traces including a interior edges and a exterior edges opposite the interior edges, the second interior edge facing the first interior edge, and stub traces, each stub trace coupled to one of the first and second transmission traces and projecting from one of the first interior edge, the first exterior edge, the second interior edge, and the second exterior edge. A substantially equal number of stub traces project from the first exterior edge and the second exterior edge. At least twice as many stub traces project from the first and second exterior edges as project from the first and second interior edges.


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