The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
Jan. 21, 2015
Hitachi High-tech Science Corporation, Minato-ku, Tokyo, JP;
Xin Man, Tokyo, JP;
Abstract
A charged particle beam apparatus includes an electron beam column and an FIB column, in which an irradiation axis of the electron beam column and an irradiation axis of the FIB column are disposed to be perpendicular or substantially perpendicular to each other on a sample without interference. In addition, the first sample stage and a second sample stage are independently provided and moved to be tilted centering on an axial direction. The sample is moved by the first sample stage and a sample piece which is cut off from the sample is moved to be fixed to a tip end of a probe which is rotatable centering on the axial direction, thereby manufacturing the sample piece which reduces the influence of a curtaining effect.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile