The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
Jun. 13, 2013
Asml Netherlands B.v., Veldhoven, NL;
Ruud Antonius Catharina Maria Beerens, Roggel, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Marinus Maria Johannes Van De Wal, Oirschot, NL;
Wilhelmus Henricus Theodorus Maria Aangenent, 's-Hertogenbosch, NL;
Richard Henricus Adrianus Van Lieshout, Batenburg, NL;
Henricus Martinus Johannes Van De Groes, Tiel, NL;
Saartje Willemijn Van Der Hoeven, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.