The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Jan. 11, 2011
Applicants:

W. Karl Olander, Indian Shores, FL (US);

Paul J. Marganski, Seymour, CT (US);

Inventors:

W. Karl Olander, Indian Shores, FL (US);

Paul J. Marganski, Seymour, CT (US);

Assignee:

ENTEGRIS, INC., Billerica, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/02 (2006.01); F17C 13/08 (2006.01); F17C 11/00 (2006.01); B01D 53/04 (2006.01);
U.S. Cl.
CPC ...
F17C 13/084 (2013.01); F17C 11/00 (2013.01); F17C 11/005 (2013.01); F17C 11/007 (2013.01); B01D 53/04 (2013.01); B01D 2258/0216 (2013.01); F17C 2201/0109 (2013.01); F17C 2201/032 (2013.01); F17C 2201/056 (2013.01); F17C 2205/018 (2013.01); F17C 2205/0111 (2013.01); F17C 2205/0126 (2013.01); F17C 2205/0142 (2013.01); F17C 2205/0176 (2013.01); F17C 2205/0338 (2013.01); F17C 2205/0394 (2013.01); F17C 2250/032 (2013.01); F17C 2250/043 (2013.01); F17C 2250/0439 (2013.01); F17C 2250/0469 (2013.01); F17C 2250/0491 (2013.01); F17C 2250/0636 (2013.01); F17C 2260/044 (2013.01); F17C 2270/0518 (2013.01);
Abstract

A ventilation gas management system and process for an enclosure adapted to contain fluid supply vessel(s) and through which ventilation gas is flowed to provide safe operation in the event of leakage of fluid from a vessel. Ventilation gas flow is modulated to accommodate various hazard levels associated with the deployment and operation of such enclosure containing fluid supply vessel(s), e.g., a gas box or gas cabinet in a semiconductor manufacturing facility, thereby achieving reduction in ventilation gas requirements otherwise required for such deployment and operation.


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