The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Mar. 02, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Yoshiyuki Nakagawa, Chiba, JP;

Shingo Nakano, Chiba, JP;

Naoto Fukuda, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); C23C 16/52 (2006.01); C23C 14/54 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 14/24 (2013.01); C23C 14/546 (2013.01); C23C 16/46 (2013.01);
Abstract

A film formation method controls with accuracy the thickness of a thin film formed on a film formation object. The film formation method includes a film formation step of heating a film formation source and forming a film on a film formation object while moving the film formation source and monitoring an amount of released vapors of the film forming material using a quartz oscillator for measurement, a control step of adjusting a heating temperature of the film formation source based on the monitored value of the quartz oscillator for measurement, and a calibration step of calibrating the monitored value of the quartz oscillator for measurement, using a quartz oscillator for calibration and the quartz oscillator for measurement. The calibration step is performed in a middle of the film formation step, after movement of the film formation source is started from a waiting position.


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