The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Nov. 25, 2014
Applicant:

The Texas A&m University System, College Station, TX (US);

Inventors:

David Staack, College Station, TX (US);

Tsung-Chan Tsai, College Station, TX (US);

Assignee:

The Texas A&M University System, College Station, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61M 37/00 (2006.01); A61B 18/04 (2006.01); A61L 2/14 (2006.01); B05D 1/00 (2006.01); C23C 16/06 (2006.01); C23C 16/503 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
A61B 18/042 (2013.01); A61L 2/14 (2013.01); B05D 1/62 (2013.01); C23C 16/06 (2013.01); C23C 16/503 (2013.01); C23C 16/52 (2013.01); A61L 2202/11 (2013.01);
Abstract

A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate.


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