The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2016

Filed:

Nov. 25, 2013
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Jinhyun Shin, Suwon-si, KR;

Minchul Kim, Hwaseong-si, KR;

Seong Soon Cho, Suwon-si, KR;

Seungwook Chol, Yongin-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/105 (2006.01); H01L 27/06 (2006.01); H01L 27/115 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1052 (2013.01); H01L 27/0629 (2013.01); H01L 27/105 (2013.01); H01L 27/11526 (2013.01); H01L 27/11531 (2013.01); H01L 28/20 (2013.01);
Abstract

In a semiconductor device and a method of making the same, the semiconductor device comprises a substrate including a first region and a second region. At least one first gate structure is on the substrate in the first region, the at least one first gate structure including a first gate insulating layer and a first gate electrode layer on the first gate insulating layer. At least one isolating structure is in the substrate in the second region, a top surface of the isolating structure being lower in height than a top surface of the substrate. At least one resistor pattern is on the at least one isolating structure.


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