The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2016
Filed:
Oct. 01, 2014
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Jae-Hwang Sim, Hwaseong-si, KR;
Jinhyun Shin, Suwon-si, KR;
Abstract
Methods of fabricating semiconductor devices are provided including performing two photolithography processes and two spacer processes such that patterns are formed to have a pitch that is smaller than a limitation of photolithography process. Furthermore, line and pad portions are simultaneously defined by performing the photolithography process once and, thus, there is no necessity to perform an additional photolithography process for forming the pad portion. Related devices are also provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile