The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Dec. 12, 2013
Asml Netherlands B.v., Veldhoven, NL;
Paul A. McKenzie, Encinitas, CA (US);
Robert A. Bergstedt, Carlsbad, CA (US);
Paul William Binun, Chula Vista, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An extreme ultraviolet light system includes a target material delivery system configured to produce a target material; and a beam delivery system that is configured to receive an amplified light beam emitted from a drive laser system and to direct the amplified light beam toward a target location that receives the target material. The beam delivery system includes a final focus assembly that focuses the amplified light beam at a focal location to enable interaction between the amplified light beam and the target material to cause the target material to be converted into a plasma that emits extreme ultraviolet light. The final focus assembly includes at least one transmissive optical element having at least one curved surface through which the amplified light beam travels; and at least one reflective optical element having at least one curved surface on which the amplified light beam is reflected.