The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Jan. 15, 2013
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Christianus Martinus Van Heesch, Eindhoven, NL;
Hieronymus Johannus Christiaan Meessen, Eindhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2006.01); G06T 7/60 (2006.01); G06F 17/50 (2006.01); G01B 11/03 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0008 (2013.01); G01B 11/03 (2013.01); G03F 7/0002 (2013.01); G03F 7/70625 (2013.01); G06F 17/5045 (2013.01); G06T 7/001 (2013.01); G06T 7/0006 (2013.01); G06T 7/60 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20032 (2013.01); G06T 2207/20061 (2013.01); G06T 2207/30108 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method and system to analyze various dimensional parameters of a structure, such as a self-assembled block copolymer structure whether formed by graphoepitaxy or chemical epitaxy. The method involves image processing including median filtering and feature detection to determine critical dimension information, and optionally the use of a Hough transform to find periodicity values and to determine placement errors.