The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2016

Filed:

May. 21, 2010
Applicants:

Shinichi Hoshi, Kawagoe, JP;

Masaharu Ito, Tokyo, JP;

Kazue Uemura, Tokyo, JP;

Yuta Suzuki, Tokyo, JP;

Inventors:

Shinichi Hoshi, Kawagoe, JP;

Masaharu Ito, Tokyo, JP;

Kazue Uemura, Tokyo, JP;

Yuta Suzuki, Tokyo, JP;

Assignee:

LINTEC CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/48 (2006.01); H01L 31/049 (2014.01); B32B 27/06 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
C23C 14/48 (2013.01); B32B 27/06 (2013.01); H01L 31/049 (2014.12); B32B 2307/7244 (2013.01); G02F 1/133305 (2013.01); G02F 2201/501 (2013.01); G02F 2201/503 (2013.01); Y02E 10/50 (2013.01);
Abstract

A formed article comprising a gas barrier layer that is formed of a material including at least an oxygen atom, a carbon atom, and a silicon atom, the gas barrier layer including an area (A) where an oxygen atom content rate gradually decreases, and a carbon atom content rate gradually increases in a depth direction from a surface, the area (A) including a partial area (A) and a partial area (A), the (A) having a specific oxygen, carbon and silicon content, and the (A) having a specific oxygen, carbon and silicon content; a method of producing the same; an electronic device member; an electronic device. The formed article exhibits an excellent gas barrier capability, excellent bendability, excellent adhesion, and excellent surface flatness.


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