The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

Oct. 27, 2014
Applicant:

University of Florida Research Foundation, Inc., Gainesville, FL (US);

Inventors:

Arthur Foster Hebard, Gainesville, FL (US);

Sefaattin Tongay, Mesa, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); H01L 29/47 (2006.01); H01L 29/778 (2006.01); H01L 29/812 (2006.01); H01L 29/872 (2006.01); H01L 29/78 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1606 (2013.01); H01L 29/47 (2013.01); H01L 29/475 (2013.01); H01L 29/7786 (2013.01); H01L 29/78 (2013.01); H01L 29/812 (2013.01); H01L 29/872 (2013.01); H01L 29/1608 (2013.01); H01L 29/2003 (2013.01);
Abstract

Various embodiments are provided for graphite and/or graphene based semiconductor devices. In one embodiment, a semiconductor device includes a semiconductor layer and a semimetal stack. In another embodiment, the semiconductor device includes a semiconductor layer and a zero gap semiconductor layer. The semimetal stack/zero gap semiconductor layer is formed on the semiconductor layer, which forms a Schottky barrier. In another embodiment, a semiconductor device includes first and second semiconductor layers and a semimetal stack. In another embodiment, a semiconductor device includes first and second semiconductor layers and a zero gap semiconductor layer. The first semiconductor layer includes a first semiconducting material and the second semi conductor layer includes a second semiconducting material formed on the first semiconductor layer. The semimetal stack/zero gap semiconductor layer is formed on the second semiconductor layer, which forms a Schottky barrier.


Find Patent Forward Citations

Loading…