The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Feb. 18, 2015
Applicant:
Jeol Ltd., Tokyo, JP;
Inventors:
Noriyuki Kobayashi, Tokyo, JP;
Yoshiaki Takizawa, Tokyo, JP;
Assignee:
JEOL Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/3175 (2013.01);
Abstract
A charged-particle beam lithographic system () delineates a pattern on a substrate () by directing a charged-particle beam (L) at the substrate. The system () includes a substrate stage () on which the substrate () is disposed and a substrate cover (). The cover () has a frame portion () that covers an outer peripheral portion of the substrate () as viewed within a plane. The frame portion () has a first part () disposed on the stage () and a second part () capable of being loaded and unloaded on and from the stage () by a transport portion (). When the second part () is loaded on the stage (), it is electrically grounded.