The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

May. 29, 2012
Applicants:

Gerardo Bottiglieri, Veldhoven, NL;

Elliott Gerard MC Namara, Eindhoven, NL;

Ruben Alvarez Sanchez, Veldhoven, NL;

Inventors:

Gerardo Bottiglieri, Veldhoven, NL;

Elliott Gerard Mc Namara, Eindhoven, NL;

Ruben Alvarez Sanchez, Veldhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/47 (2006.01); G01N 21/956 (2006.01); G03F 7/20 (2006.01); G06F 19/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/70625 (2013.01); G01N 21/47 (2013.01); G01N 21/956 (2013.01); G03F 7/705 (2013.01); G03F 7/70516 (2013.01); G03F 7/70633 (2013.01); G01N 2021/95615 (2013.01);
Abstract

A method defines one or more monitoring target profiles, collects and stores initial calibration data of the metrology apparatus, compiling a library of spectra that would be observed from inspection of the monitoring target profiles using the metrology apparatus calibrated according to the initial calibration data. Some operations can be performed periodically, e.g., on a daily basis: obtaining current calibration data from the apparatus, modeling the effect of the current calibration data on the metrology apparatus operation, and using the result of the modeling and the contents of the library to determine any differences between one or more values of the initial calibration data and the current calibration data, and how these changes will be translated into changes in the measurement output for a given number of stacks and geometries.


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