The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Jun. 09, 2014
Applicant:
Taiwan Semiconductor Manufacturing Company Limited, Hsin-Chu, TW;
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Company Limited, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01);
Abstract
Among other things, techniques for balancing mask loading are provided for herein. In some embodiments, one or more windows are defined within a layout. Based upon polygons comprised within respective windows, a localized mask loading is computed for the layout. In some embodiments, a global mask loading is also computed for the layout. Using the localized mask loading and the global mask loading, if computed, a loading effect of a plurality of mask pattern schemes is evaluated to identify a mask pattern scheme having a desired loading effect.