The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Mar. 04, 2013
Cabot Microelectronics Corporation, Aurora, IL (US);
Hon Wu Lau, Singapore, SG;
Haresh Siriwardane, Dayton, OH (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention provides a chemical-mechanical polishing composition containing (a) abrasive particles, (b) a polymer, and (c) water, wherein (i) the polymer possesses an overall charge, (ii) the abrasive particles have a zeta potential Zmeasured in the absence of the polymer and the abrasive particles have a zeta potential Zmeasured in the presence of the polymer, wherein the zeta potential Zis a numerical value that is the same sign as the overall charge of the polymer, and (iii) |zeta potential Z|>|zeta potential Z|. The invention also provides a method of polishing a substrate with the polishing composition.