The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Jul. 07, 2014
Asml Netherlands B.v., Veldhoven, NL;
Yezheng Tao, San Diego, CA (US);
John Tom Stewart, IV, San Diego, CA (US);
Jordan Jur, San Diego, CA (US);
Andrew LaForge, Poway, CA (US);
Daniel Brown, San Diego, CA (US);
Jason M. Arcand, Escondido, CA (US);
Alexander A. Schafgans, San Diego, CA (US);
Michael A. Purvis, San Diego, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.