The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2016

Filed:

Apr. 29, 2014
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Hsieh-Hung Hsieh, Taipei, TW;

Tzu-Jin Yeh, Hsinchu, TW;

Sa-Lly Liu, HsinChu, TW;

Tzong-Lin Wu, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/538 (2006.01); H01L 25/065 (2006.01); H01L 23/48 (2006.01); H01L 23/522 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5384 (2013.01); H01L 23/481 (2013.01); H01L 23/5223 (2013.01); H01L 23/5226 (2013.01); H01L 23/5227 (2013.01); H01L 25/0657 (2013.01); H01L 24/05 (2013.01); H01L 24/13 (2013.01); H01L 24/16 (2013.01); H01L 24/17 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/05009 (2013.01); H01L 2224/13025 (2013.01); H01L 2224/16146 (2013.01); H01L 2224/16225 (2013.01); H01L 2224/17181 (2013.01); H01L 2225/06513 (2013.01); H01L 2225/06517 (2013.01); H01L 2225/06541 (2013.01); H01L 2225/06544 (2013.01); H01L 2225/06565 (2013.01); H01L 2924/14 (2013.01); H01L 2924/30105 (2013.01); H01L 2924/30107 (2013.01);
Abstract

An electromagnetic bandgap (EBG) cell comprises a plurality of first conductive line layers beneath a first integrated circuit (IC) die, wherein wires on at least one of the first conductive line layers are each connected to one of a high voltage source and a low voltage source and are oriented to form a first mesh structure at a bottom of the EBG cell. The EBG cell further comprises a pair of through-substrate-vias (TSVs) above the plurality of first conductive line layers, wherein the pair of TSVs penetrate the first IC die and are connected to a high voltage source and a low voltage source, respectively, and a pair of micro bumps above a dielectric layer above the pair of TSVs, wherein the micro bumps connect the TSVs of the first IC die with a plurality of second conductive line layers formed on a second IC die.


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