The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2016

Filed:

Apr. 17, 2015
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Everardo Torres Flores, Folsom, CA (US);

Hernan A. Castro, Shingle Springs, CA (US);

Jeremy M. Hirst, Orangevale, CA (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 7/00 (2006.01); G11C 13/00 (2006.01); H01L 23/522 (2006.01); G11C 5/02 (2006.01); G11C 5/06 (2006.01); H01L 27/02 (2006.01); G11C 7/18 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
G11C 13/0021 (2013.01); G11C 5/025 (2013.01); G11C 5/063 (2013.01); G11C 13/0004 (2013.01); H01L 23/522 (2013.01); G11C 7/18 (2013.01); H01L 27/0207 (2013.01); H01L 27/2427 (2013.01); H01L 27/2481 (2013.01); H01L 2924/00 (2013.01); H01L 2924/0002 (2013.01);
Abstract

For multi-level interconnect metallization, each metal level maintains a parallel line arrangement within a region, and the lines of each adjacent metal level are orthogonal or otherwise cross with one another. Vertical shunting among levels for routing in different directions employs short paddles that stay within the parallel scheme, and multiple paddles within a region at the same metal level can be co-linear. Parallel lines in the same metal level can be rotated with respect to one another in adjacent regions, for example to better interface with driver circuitry with orthogonal orientations in the different regions.


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