The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Mar. 22, 2012
Applicants:
Boris Bittner, Roth, DE;
Holger Walter, Abtsgmuend, DE;
Matthias Roesch, Aalen, DE;
Inventors:
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/68 (2006.01); G03B 27/54 (2006.01); G03F 7/20 (2006.01); G03B 27/42 (2006.01); G03B 27/72 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70308 (2013.01); G03F 7/705 (2013.01); G03F 7/70266 (2013.01); G03F 7/70891 (2013.01);
Abstract
A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator.