The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Oct. 16, 2013
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Masaaki Takasuka, Kanagawa, JP;
Masatoshi Echigo, Kanagawa, JP;
Yu Okada, Okayama, JP;
Yumi Ochiai, Okayama, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/027 (2006.01); C07C 39/17 (2006.01); G03F 7/038 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C07C 39/17 (2013.01); G03F 7/004 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); H01L 21/027 (2013.01); C07C 2101/14 (2013.01); C07C 2103/92 (2013.01);
Abstract
A resist composition of the present invention is a resist composition containing a resist base material and a solvent. The resist base material contains a specific stereoisomer. A content of the specific stereoisomer in the resist base material is 50 to 100% by mass.