The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2016
Filed:
Sep. 04, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Boris Bittner, Roth, DE;
Norbert Wabra, Werneck, DE;
Sonja Schneider, Oberkochen, DE;
Ricarda Schoemer, Zusmarshausen, DE;
Martin von Hodenberg, Oberkochen, DE;
Hendrik Wagner, Aalen, DE;
Rumen Iliew, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection objective of a microlithographic projection apparatus has a wavefront correction device () comprising a mirror substrate () that has two opposite optical surfaces (), through which projection light passes, and a circumferential rim surface () extending between the two optical surfaces (). A first and a second optical system (OS, OS) are configured to direct first and second heating light (HL, HL) to different portions of the rim surface () such that at least a portion of the first and second heating light enters the mirror substrate (). A temperature distribution caused by a partial absorption of the heating light (HL, HL) results in a refractive index distribution inside the mirror substrate () that corrects a wavefront error. At least the first optical system (OS) comprises a focusing optical element () that focuses the first heating light in a focal area () such that the first heating light emerging from the focal area () impinges on the rim surface ().