The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2016

Filed:

Oct. 03, 2012
Applicant:

Edwards Limited, Crawley, West Sussex, GB;

Inventors:

Sergey Alexandrovich Voronin, Rensselaer, NY (US);

John Leslie Bidder, St. George, GB;

Andrew Arthur Chambers, Clevedon, GB;

Assignee:

Edwards Limited, Crawley, West Sussex, GB;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); B01D 53/00 (2006.01); B01D 53/32 (2006.01);
U.S. Cl.
CPC ...
B01D 53/005 (2013.01); B01D 53/32 (2013.01); B01J 19/088 (2013.01); B01D 2258/0216 (2013.01); B01D 2259/818 (2013.01); B01J 2219/0894 (2013.01);
Abstract

An apparatus for treating a gas stream includes a plasma abatement device that has a reaction chamber and a plasma torch for generating a plasma stream for injection into the chamber for treating the gas stream. A first inlet conveys a gas stream into the plasma abatement device for treatment, and a second inlet, in a normal condition of the apparatus, is in flow communication with a source of reagent for conveying a reagent into the plasma device for improving the efficiency of the treatment. In a back-up condition of the apparatus, the second inlet is in flow communication with a gas stream source for conveying a gas stream into the device for treatment.


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