The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2016
Filed:
Nov. 07, 2012
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventor:
Vahan Senekerimyan, San Diego, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01); G02B 5/00 (2006.01); F16J 15/02 (2006.01); G02B 7/00 (2006.01); H01J 35/18 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/003 (2013.01); F16J 15/02 (2013.01); G02B 7/00 (2013.01); G02B 7/007 (2013.01); H01J 35/18 (2013.01); H05G 2/008 (2013.01); Y10T 403/52 (2015.01);
Abstract
A protector for a viewport of a vacuum chamber includes a substrate material that absorbs radiation having a wavelength of an amplified light beam and radiation having a wavelength included in an emission spectra of a target material that produces EUV light when ionized by the amplified light beam. The substrate material transmits one or more of visible or near-infrared light. The protector also includes a layer formed on the substrate material, and the layer reflects radiation having the wavelength of the amplified light beam.