The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2016
Filed:
Apr. 10, 2013
Applicant:
Fujimi Incorporated, Kiyosu-shi, Aichi, JP;
Inventor:
Toshio Shinoda, Kiyosu, JP;
Assignee:
FUJIMI INCORPORATED, Kiyosu-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/06 (2006.01); C09G 1/02 (2006.01); B24B 37/04 (2012.01); C09K 3/14 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/042 (2013.01); C09K 3/1463 (2013.01); H01L 21/30625 (2013.01);
Abstract
Provided is a polishing composition used for polishing a semiconductor substrate having a through-silicon via structure, comprising an oxidizing agent having a standard electrode potential of 350 mV or more and 740 mV or less, a silicon polishing accelerating agent, a through-silicon via material polishing speed increasing agent, a silicon contamination preventing agent, and water.