The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Jun. 03, 2014
Applicant:

Akrion Systems, Llc, Allentown, PA (US);

Inventors:

Zhi Lewis Liu, Paoli, PA (US);

Hanjoo Lee, Jeoungja-Dong, KR;

Ismail Kashkoush, Orefield, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 19/00 (2006.01); H01L 21/67 (2006.01); C11D 11/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67034 (2013.01); C11D 11/0041 (2013.01); C11D 11/0047 (2013.01); C11D 11/0064 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); Y10T 428/24802 (2015.01); Y10T 428/28 (2015.01);
Abstract

A system for drying a surface of a substrate is provided. The system for drying a surface of a substrate comprising: a rotary support; a first dispenser fluidly coupled to a source of liquid, the first dispenser positioned above the surface of the substrate so as to be capable of applying a film of the liquid to the surface of the substrate; a second dispenser fluidly coupled to a source of drying fluid with a supply line, the second dispenser positioned above the surface of the substrate so as to be capable of applying the drying fluid to the surface of the substrate; and a proportional valve operably coupled to the supply line between the second dispenser and the source of drying fluid, the proportional valve capable of being incrementally adjusted from a closed position to an open position.


Find Patent Forward Citations

Loading…