The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2016
Filed:
Oct. 02, 2012
Nissan Chemical Industries, Ltd., Tokyo, JP;
Shuhei Shigaki, Toyama, JP;
Hiroaki Yaguchi, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
Bang-ching Ho, Toyama, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
A resist underlayer film forming composition for EUV lithography, comprising: as a silane, a hydrolyzable silane, a hydrolyzate of the hydrolyzable silane, a hydrolysis condensate of the hydrolyzable silane, or a mixture of any of the hydrolyzable silane, the hydrolyzate, and the hydrolysis condensate, wherein the hydrolyzable silane includes a combination of tetramethoxysilane, an alkyltrimethoxysilane, and an aryltrialkoxysilane, and the aryltrialkoxysilane is represented by formula (1):(R)—R—(CH)—Si(X)  Formula (1) In formula (1), Ris an aromatic ring consisting of a benzene ring or a naphthalene ring or a ring including an isocyanuric acid structure, Ris a substituent replacing a hydrogen atom on the aromatic ring and is a halogen atom or a Calkoxy group, and X is a Calkoxy group, a Cacyloxy group, or a halogen group.