The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Sep. 12, 2013
Applicant:
Lintec Corporation, Tokyo, JP;
Inventors:
Assignee:
LINTEC CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); H01J 37/04 (2006.01); C23C 14/48 (2006.01); H05H 1/46 (2006.01); H01J 37/32 (2006.01); C23C 14/56 (2006.01); H01J 37/317 (2006.01); H05H 1/48 (2006.01);
U.S. Cl.
CPC ...
H01J 37/04 (2013.01); C23C 14/48 (2013.01); C23C 14/562 (2013.01); H01J 37/3171 (2013.01); H01J 37/3277 (2013.01); H01J 37/32412 (2013.01); H05H 1/46 (2013.01); H05H 2001/485 (2013.01);
Abstract
An ion implantation device equipped with a vacuum chamber (), an electrode roll () on a portion of the outer circumferential part of which a film () is wound, a voltage application means () that applies a voltage to the electrode roll, and a gas introduction means () that introduces a gas into the vacuum chamber, wherein a voltage is applied to the electrode roll by means of the voltage application means and a gas is introduced by means of the gas introduction means, and an ion implantation process is performed on the surface of the film. In addition, electrode members () are provided opposing the surface of the electrode roll on which the film is wound.