The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2016

Filed:

Jun. 04, 2009
Applicants:

Selvaraj Palanisamy Chinnathambi, Taman Jurong, SG;

Haresh Siriwardane, Woolands, SG;

Inventors:

Selvaraj Palanisamy Chinnathambi, Taman Jurong, SG;

Haresh Siriwardane, Woolands, SG;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/84 (2006.01); C23F 1/00 (2006.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01); C23F 1/14 (2006.01); G11B 23/50 (2006.01);
U.S. Cl.
CPC ...
G11B 5/8404 (2013.01); C09G 1/02 (2013.01); C09K 3/1409 (2013.01); C09K 3/1463 (2013.01); C23F 1/14 (2013.01); G11B 23/505 (2013.01);
Abstract

The invention provides a chemical-mechanical polishing composition comprising alpha alumina, fumed alumina, silica, an oxidizing agent that oxidizes nickel-phosphorous, a complexing agent, and water. The invention also provides a method of chemically-mechanically polishing a substrate comprising contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.


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