The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Feb. 26, 2013
Applicant:
Applied Materials Israel Ltd., Rehovot, IL;
Inventors:
Assignee:
Applied Materials Israel Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 6/00 (2006.01); B08B 7/00 (2006.01); H01J 37/02 (2006.01); H01J 37/20 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
B08B 7/00 (2013.01); H01J 37/02 (2013.01); H01J 37/20 (2013.01); H01J 37/32862 (2013.01); H01J 2237/006 (2013.01); H01J 2237/022 (2013.01);
Abstract
A system and method are described, for use in cleaning of a vacuum chamber. The method comprising connecting a vacuum chamber to a plasma generating unit via a plasma connection port and connecting the vacuum chamber to a high vacuum pumping unit via a pumping port. A flow conductance through the plasma connection port to the vacuum chamber is controlled to limit passage of charged particles and cleaning substances produced in the plasma generating unit, to thereby maintain a working pressure inside the vacuum chamber while cleaning the vacuum chamber by said cleaning substances.