The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Aug. 19, 2014
United Microelectronics Corp., Hsin-Chu, TW;
Shi-Xiong Lin, Yilan County, TW;
Chun-Lung Chen, Tainan, TW;
Kun-Yuan Liao, Hsin-Chu, TW;
Feng-Yi Chang, Tainan, TW;
Yu-Cheng Tung, Kaohsiung, TW;
UNITED MICROELECTRONICS CORP., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A metal gate structure includes a substrate including a dense region and an iso region. A first metal gate structure is disposed within the dense region, and a second metal gate structure is disposed within the iso region. The first metal gate structure includes a first trench disposed within the dense region, and a first metal layer disposed within the first trench. The second metal gate structure includes a second trench disposed within the iso region, and a second metal layer disposed within the second trench. The height of the second metal layer is greater than the height of the first metal layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile