The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Jan. 27, 2014
Rigaku Corporation, Akishima-shi, Tokyo, JP;
Shintaro Kobayashi, Akishima, JP;
Toru Mitsunaga, Akishima, JP;
Koichi Kajiyoshi, Akishima, JP;
Kazuyoshi Arai, Akishima, JP;
RIGAKU CORPORATION, Tokyo, JP;
Abstract
There is provided an X-ray diffraction apparatus configured to irradiate a sample S on a sample stage with X-rays generated from an X-ray source and detect the X-rays diffracted by a sample using a detector, including a virtual mask setting section and a signal processing section. The detector outputs detection signals according to intensity of the X-rays received by detection elements, for each of the plurality of detection elements forming a detection surface. The virtual mask setting section is capable of setting a virtual mask on the detection surface of the detector, and setting at least an opening dimension of the virtual mask as an opening condition of the virtual mask independently in an X direction and a Y direction. The signal processing section processes the detection signals outputted from the detector according to the opening condition of the virtual mask set in the virtual mask setting section.