The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Oct. 09, 2012
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Yogesh Pramod Karade, Eindhoven, NL;
Elisabeth Corinne Rodenburg, Heeze, NL;
Peter Van Delft, Eindhoven, NL;
Raymond Wilhelmus Louis LaFarre, Helmond, NL;
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Yogesh Pramod Karade, Eindhoven, NL;
Elisabeth Corinne Rodenburg, Heeze, NL;
Peter Van Delft, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.