The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Dec. 29, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Mark Kroon, Utrecht, NL;
Kees Van Weert, Amstelveen, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G03F 7/707 (2013.01); G03F 7/7085 (2013.01); G03F 7/70341 (2013.01); G03F 9/7088 (2013.01);
Abstract
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.