The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Aug. 09, 2012
Applicants:
Masatoshi Echigo, Hiratsuka, JP;
Go Higashihara, Kurashiki, JP;
Naoya Uchiyama, Kurashiki, JP;
Inventors:
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); C07D 311/96 (2006.01); C08G 8/04 (2006.01); G03F 7/30 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C07D 311/96 (2013.01); C08G 8/04 (2013.01); G03F 7/094 (2013.01); G03F 7/30 (2013.01); G03F 7/40 (2013.01);
Abstract
Material for forming an underlayer film for lithography, which has a high carbon concentration, a low oxygen concentration, a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process is disclosed. Material for forming an underlayer film for lithography contains a compound represented by general formula (1).
Echigo, Masatoshi. (2016). Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method (U.S. Patent No. 9316913). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9316913
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile