The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Oct. 27, 2014
International Business Machines Corporation, Armonk, NY (US);
Leo Gross, Adliswil, CH;
Gerhard Meyer, Wollerau, CH;
Bruno Schuler, Siebnen, CH;
Wolfram Steurer, Adliswil, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for determining a value of a local contact potential difference by noncontact atomic force microscopy. For one or more cantilever positions above a surface of a sample: i) performing two atomic force microscopy measurements, using an oscillating cantilever, ii) thereby determining two distinct voltage values of DC voltage applied between the cantilever and the sample, and iii) obtaining a value of a local contact potential difference based, at least in part, on the two distinct voltage values determined. Wherein substantially similar distinct values indicate a substantially similar value of frequency shifts of cantilever oscillation, as measured for each of said distinct values.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile