The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2016

Filed:

Dec. 12, 2013
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Dan B. Millward, Boise, ID (US);

Timothy A. Quick, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 299/02 (2006.01); C08F 299/04 (2006.01); H01L 21/311 (2006.01); B81C 1/00 (2006.01); B82Y 30/00 (2011.01); H01L 21/033 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C08F 299/0492 (2013.01); B81C 1/00031 (2013.01); B82Y 30/00 (2013.01); C08F 299/02 (2013.01); G03F 7/0002 (2013.01); H01L 21/0337 (2013.01); H01L 21/0338 (2013.01); B81C 2201/0149 (2013.01); B81C 2201/0198 (2013.01);
Abstract

Methods for fabricating sub-lithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.


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