The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Dec. 12, 2013
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Dan B. Millward, Boise, ID (US);
Timothy A. Quick, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 299/02 (2006.01); C08F 299/04 (2006.01); H01L 21/311 (2006.01); B81C 1/00 (2006.01); B82Y 30/00 (2011.01); H01L 21/033 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C08F 299/0492 (2013.01); B81C 1/00031 (2013.01); B82Y 30/00 (2013.01); C08F 299/02 (2013.01); G03F 7/0002 (2013.01); H01L 21/0337 (2013.01); H01L 21/0338 (2013.01); B81C 2201/0149 (2013.01); B81C 2201/0198 (2013.01);
Abstract
Methods for fabricating sub-lithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Quick Actions:
Millward, Dan. (2016). Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference (U.S. Patent No. 9315609). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9315609
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile