The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2016

Filed:

Dec. 07, 2011
Applicants:

Jeffrey P. Gambino, Westford, VT (US);

Derrick Liu, Winooski, VT (US);

Daniel S. Vanslette, Fairfax, VT (US);

Inventors:

Jeffrey P. Gambino, Westford, VT (US);

Derrick Liu, Winooski, VT (US);

Daniel S. Vanslette, Fairfax, VT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 1/09 (2006.01); B05D 5/12 (2006.01); B82Y 99/00 (2011.01); H01L 31/18 (2006.01); H01L 31/0224 (2006.01); H01L 33/00 (2010.01); H01L 33/42 (2010.01); H01L 51/00 (2006.01); B82Y 10/00 (2011.01); B82Y 30/00 (2011.01); H01B 1/24 (2006.01); H05K 3/10 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1884 (2013.01); B82Y 10/00 (2013.01); H01L 31/022408 (2013.01); H01L 31/022425 (2013.01); H01L 31/022466 (2013.01); H01L 33/005 (2013.01); H01L 33/42 (2013.01); H01L 51/0021 (2013.01); B82Y 30/00 (2013.01); H01B 1/24 (2013.01); H05K 3/105 (2013.01); H05K 2201/0108 (2013.01); H05K 2201/026 (2013.01); H05K 2203/1194 (2013.01); Y02E 10/50 (2013.01);
Abstract

Disclosed are embodiments of a structure with a metal silicide transparent conductive electrode, which is commercially viable, robust and safe to use and, thus, optimal for incorporation into devices, such as flat panel displays, touch panels, solar cells, light emitting diodes (LEDs), organic optoelectronic devices, etc. Specifically, the structure can comprise a substrate (e.g., a glass or plastic substrate) and a transparent conducting film on that substrate. The transparent conducting film can comprise a metal silicide nanowire network. For example, in one embodiment, the metal silicide nanowire network can comprise multiple metal silicide nanowires fused together in a disorderly arrangement so that they form a mesh. In another embodiment, the metal silicide nanowire network can comprise multiple metal silicide nanowires patterned so that they form a grid. Also disclosed herein are various different method embodiments for forming such a structure.


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