The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2016

Filed:

Apr. 24, 2014
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Anton Mauder, Kolbermoor, DE;

Franz Hirler, Isen, DE;

Armin Willmeroth, Augsburg, DE;

Michael Rueb, Faak am See, AT;

Holger Kapels, Holzkirchen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/36 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01); H01L 21/266 (2006.01); H01L 29/06 (2006.01); H01L 29/417 (2006.01);
U.S. Cl.
CPC ...
H01L 29/36 (2013.01); H01L 21/266 (2013.01); H01L 29/0615 (2013.01); H01L 29/0634 (2013.01); H01L 29/0878 (2013.01); H01L 29/105 (2013.01); H01L 29/1095 (2013.01); H01L 29/66712 (2013.01); H01L 29/7395 (2013.01); H01L 29/7811 (2013.01); H01L 29/0619 (2013.01); H01L 29/0688 (2013.01); H01L 29/41766 (2013.01);
Abstract

A semiconductor device has a cell field with drift zones of a first type of conductivity and charge carrier compensation zones of a second type of conductivity complementary to the first type. An edge region which surrounds the cell field has a higher blocking strength than the cell field, the edge region having a near-surface area which is undoped to more weakly doped than the drift zones, and beneath the near-surface area at least one buried, vertically extending complementarily doped zone is positioned.


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