The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Aug. 18, 2014
United Microelectronics Corp., Hsin-Chu, TW;
Chin-Cheng Chien, Tainan, TW;
UNITED MICROELECTRONICS CORP., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
The present invention provides a method for forming a semiconductor structure, including the following steps: Firstly, a substrate is provided, the substrate has a first region defined thereon, a plurality of fin structure is disposed within the first region, and an insulating layer is disposed on the substrate and between each fin structure; next, a first material layer is then formed on the insulating layer, and the fin structures is exposed simultaneously, afterwards, the fin structure is partially removed, and an epitaxial layer is then formed on the top surface of each remained fin structure.