The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Jul. 18, 2011
Adrianus Hendrik Koevoets, Mierlo, NL;
Michael Jozef Mathijs Renkens, Sittard, NL;
Sander Frederik Wuister, Eindhoven, NL;
Adrianus Hendrik Koevoets, Mierlo, NL;
Michael Jozef Mathijs Renkens, Sittard, NL;
Sander Frederik Wuister, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.