The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2016

Filed:

Feb. 24, 2014
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Shang-Hui Tu, Jhubei, TW;

Chih-Jen Huang, Yilan County, TW;

Jui-Chun Chang, Hsinchu, TW;

Shin-Cheng Lin, Tainan, TW;

Yu-Hao Ho, Keelung, TW;

Wen-Hsin Lin, Jhubei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 21/70 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66681 (2013.01); H01L 29/105 (2013.01); H01L 29/1095 (2013.01); H01L 29/66712 (2013.01); H01L 29/7802 (2013.01); H01L 29/7816 (2013.01); H01L 29/7835 (2013.01);
Abstract

A semiconductor device is provided. The device includes a substrate having a first conductivity type. The device further includes a drain region, a source region, and a well region disposed in the substrate. The well region is disposed between the drain region and the source region and having a second conductivity type opposite to the first conductivity type. The device further includes a plurality of doped regions disposed within the well region. The doped regions are vertically and horizontally offset from each other. Each of the doped regions includes a lower portion having the first conductivity type, and an upper portion stacked on the lower region and having the second conductivity type.


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